904 - Compound Semiconductor Plasma Processing Equipment
This is a contract result notice, not an open opportunity. Details from the official award data.
The College of Engineering and Physical Sciences (EPS) at Aston university is creating a III-V semiconductor fabrication facility.
As a consequence, we are seeking a single supplier to provide a suite of plasma processing tools for: • ICP Etch of semiconductor materials (e.g.
GaAs, GaN, InP, GaSb) • RIE Etch of dielectric materials (e.g.
SiO2, SiNx) and metals (e.g.
Au, Ge, Cr, Ti, Pt, Pd) • Deposition of dielectric layers (e.g.
SiO2, SiNx) The full project specific requirements and equipment specification can be found within the project question set on Aston University's e-tendering portal ProContract under Section 11 - Project Specific Requirements.
What the supplier must deliver
As a consequence, we are seeking
As a consequence, we are seeking a single supplier to provide a suite of plasma processing tools for:.
Derived from the notice text — always confirm against the original documents.
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- OCID
- 6be2440e-7977-4792-b353-44a668924856
- Stage
- contract · Contract
- Source
- Contracts Finder
- Buyer ref
- ASTONUNI001-DN700099-16463002
Contains public sector information licensed under the Open Government Licence v3.0. Source data © Crown copyright.
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