Electron Beam and Sputter Physical Vapour Deposition system
The University of Manchester has a requirement to acquire an advanced multi-functional plasma assisted physical vapour deposition (PVD) facility.
We would want to be able to deposit ceramic and metallic systems including alloys.
This is for a range of research applications such as corrosion and wear protection.
The system should incorporate the following features, which may be provided in one or more systems: Multi-Target Sputter PVD System incorporating at least 2 sputter targets and bias capability to the targets and substrate.
A twin Electron Beam (EB) dual-evaporant source PVD system, incorporating enhanced plasma assistance using a non-contaminating plasma intensification device based on a hollow cathode discharge.
What the supplier must deliver
We would want to be able
We would want to be able to deposit ceramic and metallic systems including alloys.
The system should incorporate the following features
The system should incorporate the following features, which may be provided in one or more systems: Multi-Target Sputter PVD System incorporating at least 2 sputter targets and bias capability to the targets and substrate.
Derived from the notice text — always confirm against the original documents.
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- OCID
- c532cb52-ebfb-412f-af4d-843e3f934de7
- Stage
- contract · Contract
- Source
- Contracts Finder
- Buyer ref
- 2019-1657-EBSPVD-SJC-MW
Contains public sector information licensed under the Open Government Licence v3.0. Source data © Crown copyright.
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